Used VARIAN VIISta PLAD #9269851 for sale

VARIAN VIISta PLAD ion implanter is a high-performance, cost-effective implanter which offers superior performance in all types of implant processes. This innovative equipment is designed for efficient, flexible, and reliable ion implantation of a wide range of materials. It is ideally suited for implantation into substrates of any size and complexity. VIISta PLAD ion implanter is a cost-effective, efficient and accurate equipment that can perform high speed and precision-level implant operations with minimal material waste. It can work with various implant sources, including D+/D- ion sources, Si + ions and heavy ion sources such as B2+, B5+ and Ga2+. The system can also cope with different dosimetry requirements, and allows implantation without the need for additional hardware. VARIAN VIISta PLAD ion implanter provides excellent beam uniformity and flexibility in beam delivery. It has an integrated field control unit which ensures a uniform field across the entire wafer and helps to keep the dose-to-depth ratio uniform. This machine also reduces the number of wafers requiring rework, thus increasing implant efficiency. VIISta PLAD monitor is designed to provide real-time data and continuous control of all important implant parameters. The monitor is integrated with a powerful suite of software and diagnostics tools which allow users to monitor the beam parameters, as well as a beam spot size. This makes it easier to make any necessary adjustments at each process step, without impacting the overall process time or accuracy. VARIAN VIISta PLAD ion implanter is a versatile tool which can be used for numerous applications, such as heavy ion implantation, shallow junctions, metal implants, as well as implantation of wafers of various shapes and sizes. This tool also offers excellent value for money and is highly reliable and easy to use. For these reasons, it is an ideal choice for manufacturers of a range of different products and applications.