Used VARIAN VIISta PLAD #9284877 for sale

VARIAN VIISta PLAD is an ion implanter and monitor designed to provide advanced doping control in semiconductor wafer processing. In semiconductor manufacturing, ion implantation is an essential step that strategically places ions of various elements into the substrate material, producing different conductivity levels which are necessary for the fabrication of complex semiconductor devices. VIISta PLAD is a fully automated equipment capable of performing both ion implantation and monitoring in a single module. The system provides precise, repeatable, accurate, and cost-effective results while providing load sizes up to 4" (100 mm) for versatile production requirements. With a maximum beam energy of nearly 1 MeV, the VIISta is able to implant complex, high-reliability devices in a variety of substrates and wafers. In addition, VARIAN VIISta PLAD provides a wide range of available settings and capabilities, allowing users to customize the implantation process to specific requirements. The unit is powered by an open-platform PC-based control machine for easy implementation of specialized algorithms. The VIISta also features advanced data acquisition capabilities to ensure optimal results. The tool offers a choice of beam currents that range from 1nA to 5mA and a maximum dose rate over 1x1013 ions/cm2/min. The VIISta's entire work area is enclosed by a rigid hexagon beamline that provides optimal protection against vacuum leakage. An integrated vacuum asset circulates clean, filtered air within the work area to reduce impurity levels during processing. This helps provide consistent, reliable results when doping different substrates and wafers. The VIISta is also equipped with an advanced ion source package. This includes a microwave source for the generation of ions and a large selection of selectable gases from which to choose. The ion source module offers programmable control of beam current, shape, and spot size for each implant operation. VIISta PLAD is an advanced, highly-adaptable implantation and monitoring model that offers greater dose uniformity and improved process control over other available systems. It provides auto-parameterization capabilities, ensuring optimal process characterization, as well as a wide variety of customizable options, making it an ideal choice for advanced semiconductor wafer processing.