Used VARIAN VIISta #293596002 for sale

VARIAN VIISta ion implanter and monitor is a sophisticated, precision tool used in the semiconductor industry to manipulate electrical charge and current. It is used primarily for ion implantation and monitoring, though it has many other capabilities as well. Ion implantation is a process in which ions are accelerated and passed through a solid material to alter its electrical properties. This is done to control the structure of the material, its physical characteristics, and even its chemical composition. VIISta is used to precisely control the concentration, type, and speed of this ion acceleration to ensure accurate and consistent results. VARIAN VIISta includes a powerful, high-energy electron gun that serves as the ion source. This gun is able to reach energies of up to 100 keV, which is more than sufficient to implant ions into a variety of materials. The data readouts from the gun are sent to the computer housed in VIISta for further processing, greater control, and increased accuracy. VARIAN VIISta also contains a high-end control equipment that monitors the output from the electron gun. This system allows for fine tuning of the speed and type of ions, as well as their concentration. This is especially helpful in implantation processes, as it allows for the precise and safe control of the energy levels and the implantation direction. This unit is also able to monitor the current state of the process too. Thanks to high-precision temperature and voltage monitoring, any changes in the state of the implantation process can be immediately identified and tracked. This allows for greater precision and quicker reduction of any issues that may arise. Finally, VIISta incorporates a safety machine that shuts down the entire process if a safety risk is identified. This helps to keep personnel safe and the implantation process running efficiently and accurately. In conclusion, VARIAN VIISta ion implanter and monitor is a highly advanced and reliable piece of equipment. It takes the guesswork out of ion implantation, allowing for greater accuracy and precision, as well as improved safety.