Used VARIAN VIISta #9265745 for sale

VARIAN VIISta is a state-of-the-art ion implanter and monitor developed and distributed by VARIAN Semiconductor Equipment Associates. It is designed to create regions within a semiconductor material that have an increased concentration of ions. It is a fully automated equipment that is capable of accurately and precisely regulating the number and type of ions that are implanted in a material. VIISta implements a variety of high-end features that make it especially useful in the semiconductor industry. It has advanced process control capabilities, allowing it to monitor and regulate ion implantation levels on a constant basis. This system can also adjust the implantation conditions in real-time, making it ideal for operations requiring rapid changes to implantation parameters. VARIAN VIISta utilizes highly precise beam optics to create uniform ion implants, ensuring a consistent level of performance throughout the process. This unit also features a quadrupole scanner electron beam, which provides an efficient and reliable way of moving the beam along the range of the implant. VIISta also offers advanced diagnostic tools, such as particle analysis and laser scatter / count measurements that enable operators to check on the progress of their implanted materials. In addition, VARIAN VIISta also contains a powerful software suite that is used to control all aspects of its operation. This suite of software tools includes a number of features that optimize implantation processes, including the ability to simulate and analyze implant rates, compute dose rate requirements, and monitor implant uniformity. This suite also includes extensive data logging capabilities, which allow users to track all aspects of their implant process. Overall, VIISta is a powerful and efficient ion implanter and monitor machine. Its robust features and advanced software suite make it an ideal choice for operating complex implantation operations. Its valuable process monitoring and control features enable quick and accurate tuning of implantation parameters, ensuring consistent and reliable performance on each run.