Used COMMONWEALTH SCIENTIFIC IDM-1200 #9120308 for sale

COMMONWEALTH SCIENTIFIC IDM-1200 is an ion milling equipment designed for use in a wide variety of research, industrial and commercial applications where precise thin film surface preparation is required. Specifically, IDM-1200 is intended for physical etching and lithography of small structures on substrates such as silicon, metal and polymers. COMMONWEALTH SCIENTIFIC IDM-1200 utilizes a combination of ion beam energies to create a planar lithography pattern of desired shapes. It features an active area of 13.5 cm square which is capable of accommodating various sizes of substrates with maximum dimensions of 12.7cm x 12.7cm. The system utilizes a digitally controlled ion energy generator and a high vacuum chamber which are monitored by a series of precise temperature-controlled and electronically distributed sensors. This allows for highly accurate measurements of the entire etching process. The unit is equipped with a direct current source that provides a stable and reliable ion beam with a high charging rate and low ion divergence. This, in conjunction with a multi-stage filtration machine, ensures a highly uniform etching process with minimum distortion, leading to very high-resolution patterns. It is also equipped with a plasma cleaning coil to efficiently remove any residues from the etching process. Furthermore, the selected design materials used in the tool make it highly robust and reliable with excellent endurance capability. Furthermore, its automated control systems and feedback loops enable virtually continuous operation, increasing the repeatability and consistency of the etched patterns. In conclusion, IDM-1200 is an ideal physical etching asset for any research or industrial applications where precise thin-film surface preparation is required. With its comprehensive yet non-intimidating user-interface, COMMONWEALTH SCIENTIFIC IDM-1200 provides users with a highly efficient etching process that is capable of designing complex lithography patterns with very little margin of error. Its flexibility, robustness and superior performance ensure that it remains one of the most reliable and cost-effective ion milling systems on the market.