Used FEI Expida 1255 #9197127 for sale

FEI Expida 1255 is an ion milling equipment optimized for advanced ion etching applications. It features a liquid nitrogen cooled sample stage, which allows samples to be low-temperature irradiated for high rate patterning. This system is capable of achieving very high ion milling rates as well as high repeatability and accuracy. It is an ideal choice for ultra-precise etching needs such as nano-structuring of substrates, circuit fabrication and patterning, and precision device fabrication. Expida 1255 employs an energetic ion accelerating unit to a sample, allowing it to be machined and/or etched. Its programmable hyperflash source can deliver a range of rapid, powerful milling pulses. This machine can provide precise pulse, shape and trajectory control, as well as adjust the dose rate profiles. Additionally, the tool is equipped with a regulated supply of low-pressure argon for etching a substrate. FEI Expida 1255 features a five-axis rotation and cross-axis positioning module. This module ensures the accuracy of the beam path to the substrate for etching. Additionally, the asset includes a sample vacuum chucking model and a sample holder, for excellent in-situ response to mechanical stress and strain. Other features include a built-in liquid nitrogen as well as a temperature-controlled water jacket for cooling substrates. Expida 1255 is designed for compatibility with most standard wafer processing tools, such as equipment for physical vapor deposition and chemical vapor deposition. An intuitive graphical user-interface (GUI) provides the operator with complete control over the etching process. Customized recipes can also be easily created and stored for future use. The equipment is safe, reliable and requires minimal maintenance, making it well-suited for industrial and laboratory use. FEI Expida 1255 is a reliable, highly customizable and capable ion milling system for a wide range of applications. From lithography to device fabrication, the unit can address a variety of needs with its advanced features and intuitive user interface. Plus, the wide range of performance parameters makes the machine an ideal choice for precision applications that require very high precision and repeatability at extremely high resolution.