Used FEI Expida 1265 #9200544 for sale

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Manufacturer
FEI
Model
Expida 1265
ID: 9200544
Wafer Size: 12"
FIB / SEM Dual ion beam, 12".
FEI Expida 1265 is a dual beam ion milling equipment designed to produce 3-dimensional subsurface effects for materials without the expense and time intensive masking or lithography techniques. This system has a variable-angle spherical ion beam which uses a combination of sputter etching and ion milling technology to affect materials at a nano-level, resulting in etching, sculpting, and engraving of detailed shapes and reliefs. The unit utilizes an advanced digital servo control mechanism that enables the user to control a wide range of beam profiles and angles to produce precise and intricate patterns of features. The maximum beam scan velocity of the device is up to approximately 8 m/s, enabling high throughput machining processes on a variety of materials including plastics, metals, ceramics, and semiconductors. The process capability of the machine is between 200 nm and 2 µm, utilizing a variable spot size and a programmable current. Expida 1265 offers dual beam ion milling with the ability to operate two separate beams simultaneously, allowing for very precise patterning and sculpting of large areas. In addition, due to its low inertia design, the device can easily be used for dynamic etching and drilling processes. The tool is supplied with a range of additional components, such as vacuum chambers and different vacuum pumps, for complete systems integration. The asset can also be integrated with existing systems, allowing for a greater degree of control and adaptability. The model provides a wide variety of commands and feedback settings, allowing precise control over parameters such as sputter etching duration, beam angle, and current level. The comprehensive range of commands and settings enable the user to finely tune their process parameters to produce precise, intricate patterns of features. The intuitive user interface also simplifies programming, with an easy-to-use graphical interface optimized for both parameter input and machine control. Overall, FEI Expida 1265 is an advanced ion milling equipment engineered to produce precise patterns of features in material substrates. Its dual beam capability, variable beam angle, and range of feedback settings make it desirable for a variety of nanotech applications. Its high resolution, accuracy, low inertia design and integrated systems ensure this system can deliver all the components needed for a precise, high-quality machining process.
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