Used FEI Expida 1265 #9210949 for sale

FEI Expida 1265
Manufacturer
FEI
Model
Expida 1265
ID: 9210949
System.
FEI Expida 1265 is an advanced ion milling equipment capable of removing materials with sub-angstrom precision. The system utilizes a dual source beam of hydrogen and oxygen ions that strike substrates and cause removal of material through sputtering and etching. Data is collected in 3D regarding the ion beam position, profiles, beam angles, and areas of impact in order to accurately monitor the material removal. The unit offers a nitrogen machine and planar magnet that produce a maximum acceleration voltage of 12 kV and a beam current of up to 12 mA. Expida 1265 has a vacuum chamber with a volume of 1.8 liters and can reach a base pressure of better than 4.0 x 10-7 Torr, sealed with a non-evaporative valve for improved chamber performance and condition costs. It has an accelerated ion beam that utilizes hydrodynamic lense technology to deliver the most exacting ion beam for high resolution imaging. The tool features an auto-focusing asset that uses infrared laser optics to ensure that the chamber running conditions are optimized. The mass loss spectrometer is also a unique feature of FEI Expida 1265.IT can be used to measure molecular masses and reactions that occur within the vacuum chamber during milling or etching. The model is feature an automatic chamber refresh equipment that can detect and eradicate any residue and dust in the chamber, ensuring that the chamber performs at optimal conditions. Expida 1265 also includes a unique dual - navigation vision system. This unit uses advanced image analysis to map out the chamber workspace and calculate the two and three dimensional parameters required for precision ion milling. This machine is capable of measuring features down to the atomic level, producing high-quality images with extreme detail. This allows for accurate ion beam targeting and precise material removal. Finally, FEI Expida 1265 has a flexible software control package with a user-friendly graphical interface. This control tool can be used to monitor key parameters such as gas and pressure levels, acceleration voltage, and chamber temperatures. The software also allows for control of the ion beam formation, milling and etching processes. By leveraging these advanced software systems and ion milling systems, users can create repeatable and accurate processes for high-precision designs.
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