Used FEI Helios 400 #9408454 for sale

FEI Helios 400 is an ion milling equipment designed to produce patterns on surfaces and in materials. It uses a focused ion beam (FIB) to etch away material through a process known as sputtering. This allows for the precise creation of electrical probes, deep trenches, and other microstructures. The combination of charged particles and the FIB create a highly localized ion milling process that allows users to etch away material at very high resolutions. Helios 400 offers a variety of features that make it ideal for microfabrication tasks. The system features a field emission gun (FEG) that is capable of providing up to 400 keV. This high energy level allows for etching of materials at very small scales, allowing users to create patterns on the order of 1-2 nm. The unit also features advanced pattern recognition capabilities, allowing users to quickly identify features on surfaces. FEI Helios 400 has a high-contrast imaging machine, providing users with clear images of very small structures. This is especially important when creating trenches with very small dimensions. The enhanced imaging also allows for increased process speed as the tool is able to quickly and accurately detect edges on the surfaces to be worked on. Helios 400 also includes a vacuum chamber for operation in a clean environment. This environment helps to prevent contamination of the workpiece and ensures that the workpiece remains safe from deleterious contaminants. The asset is able to support a wide range of gases, which can be used to further enhance the etching process. FEI Helios 400 comes with several software packages that allow users to quickly and easily design, manage, and control the etching process. These programs are designed to make etching more efficient and less time consuming. The model also features an automated setting adjustment capability, allowing users to adjust settings to optimize the etching process for a specific job. Helios 400 is an ideal tool for microfabrication tasks. Its high energy ion beam, advanced pattern recognition capabilities, and vacuum chamber make it perfect for etching very precise patterns in materials. The equipment's automated setting adjustment and software packages also make it very user-friendly, allowing users to quickly and easily set up the system and achieve the desired results. All of these features combine to make FEI Helios 400 a valuable asset in any microfabrication environment.