Used FEI Helios NanoLab 400 #9285570 for sale

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Manufacturer
FEI
Model
Helios NanoLab 400
ID: 9285570
Vintage: 2007
Dual Beam Focused Ion Beam (DB FIB) system Microscope controller PC Monitor Switch box Keyboard and mouse Electrical console EDWARDS XDS 35 Vacuum pump NESLAB ThermoFlex 900 Chiller EVACTRON 10 Plasma Cleaner Does not include OmniProbe Options: SEM Column Elstar FIB Column Sidewinder (4) GIS: Idep, IEE, PT, EE Power supply: 190-240 VAC, 50/60 Hz, Single phase 2007 vintage.
FEI Helios NanoLab 400 is an Er/FIB dual-beam equipment capable of precisely abrading materials down to the nanoscale. The gold-standard of Focused Ion Beam (FIB) and Electron Beam (EB) systems, FEI Helios is a highly sought-after ion milling system. Taking advantage of both simultaneous electron and ion beam sources, powerful features like tilted sample environments come standard, which expands the capability for more complex 3D ablation scenarios; a welcomed affordance for advanced analytical and materials science projects. Offering outstanding resolutions, improved on other control systems, the Helios NanoLab allows for greater x-y control for sharp clarity, allowing for meticulous and precise ultra-fine milling applications. Utilizing a flexible optical path, various detectors can be specifically switched to optimize imaging performance and user experience. The NanoLab 400 also sports atomic resolution X-ray fluorescence (XRF) spectrometry, which allows for rapid and non-destructive trace element analysis. Minting accuracy and overall abrasion performance make Helios NanoLab 400 the perfect unit for researchers and scientists performing precision nano machining. Employing ultra-stable electron optics for qualitative techniques such as STEM, the Helios is empowering for large and small research projects alike. Utilizing both the EB and FIB beams as an inlaid on the same substrate, microscopists can obtain higher resolutions than ever before, allowing for an unprecedented magnification capacity of up to one million times, depending on the sample size. The Helios machine is highly sought after due to its low drift and an advanced beam monitoring and calibration tool that allows for near instantaneous corrections and a resolution responsiveness even during highly energetic milling. For high throughput sample abrasion and analysis, FEI Helios NanoLab 400 offers unmatched performance from its dual beam column and apex resolution rates below 1 nanometer, making it the perfect asset for applications like nanostructuring, milling, imaging and analysis.
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