Used FEI Helios NanoLab 400 #9363526 for sale

Manufacturer
FEI
Model
Helios NanoLab 400
ID: 9363526
Wafer Size: 4"
Vintage: 2008
Dual beam Focused Ion Beam (FIB) system, 4" Elstar electron column Operating system: Windows XP 2002 SP3 Autoprobe 200 XEI Evactron ThermoCube Chiller User interface: FEI xT 3.8.10 FIB Sidewinder (21 nA) GIS Pt SCM IEE Omni GIS carbon Detectors: ETD CDM TLD 2008 vintage.
FEI Helios NanoLab 400 is a powerful ion milling equipment that can be used to prepare samples for high-resolution imaging and other surface analysis. It utilizes an ion beam source to sputter material from the surface of the sample in a controlled, near-monatomic thinning process. The levels of sputtering can be adjusted to ensure removal of the top few nanometres of material without damaging the underlying structure as determined by the sample geometry and the desired resolution. The system offers precise and reproducible thinning of materials down to 0.1 nm per depth step with no degradation of the surface. Helios NanoLab 400 combines a highly variable stage motion unit and course/fine detector for accurate sample positioning and analysis. The scanning stage can be parked in four pre-defined positions, allowing the machine to process different sample orientations and sizes while maintaining high positional repeatability. The integrated coarse/fine detector allows users to accurately position the sample at predetermined spots, facilitating precise targeting of features on the sample surface. The tool also offers a range of analysis techniques for determining composition and orientation of the sputtered material. The integrated accelerating voltage control feature provides a range of acceleration energies from 0.1 to 2.0kV, allowing the user to tailor the milling process to the sample properties and sample material. FEI Helios NanoLab 400 also provides an additional feature of the oxygen activation module which can be used to activate the sample surface for higher imaging resolution. Additionally, the integrated safety interlock feature safely switches off the asset in the case of any unsafe conditions. Overall, Helios NanoLab 400 is an easy-to-use and highly sophisticated ion milling model that offers precise and reproducible thinning for high-resolution imaging and surface analysis. It is designed to be compatible with a wide variety of sample types, sizes and orientations. It also offers several features to maximize safety and optimize performance.
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