Used FEI Helios NanoLab 400S #293729607 for sale

FEI Helios NanoLab 400S Ion Milling Equipment is a reliable and versatile tool for fine surface preparation of transparent optics, such as Si, GaAs, quartz, and other materials. The system consists of a shielded ultra-high vacuum chamber equipped with an ultra-flat membrane that serves as a substrate holder, a beam manipulation chamber, and a generator. It also includes a stage for sample loading and positioning, as well as an ultraviolet source for inducing ultra-violet photoresist layers. Helios NanoLab 400S Ion Milling Unit is capable of high sputter rates and low deposition rates for a wide variety of sputter/deposition materials, and can operate in both high vacuum and low-vacuum environments. The machine is controlled by a intuitive, user-friendly interface, allowing the user to quickly adjust and customize the milling process for each application. FEI Helios NanoLab 400S Ion Milling Tool uses a beam of ions to etch away unwanted material from a substrate. The ions are accelerated to high energies and directed towards the substrate. The beam of ions erodes the material at a controlled rate, creating a thin layer that can be further manipulated with e-beam lithography or other techniques. The asset is outfitted with an array of detectors that help to monitor the model's performance on a constant basis. Helios NanoLab 400S Ion Milling Equipment is capable of producing extremely fine features on substrates with a diameter of up to 15 mm. Furthermore, it is able to pattern substrates with widths up to 10 cm. The system can work with both single and multiple layers of photoresist layers, and can handle a variety of etch rates and depths. This allows for flexible electronics applications such as interconnects, passive components, and other fine-pitch structures. Finally, FEI Helios NanoLab 400S Ion Milling Unit is easy to maintain and operate, and can be quickly recalibrated to meet the requirements of various applications. With its versatile capabilities and reliability, it is an ideal choice for highly detailed and precise etching processes.