Used FEI Helios NanoLab 450S #9363521 for sale
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ID: 9363521
Dual beam SEM System
Electron source: Schottky thermal field emitter
Ion source: Gallium liquid metal, 1000 hours
STEM Resolution: 0.8 nm
SEM Resolution: Optimal WD
0.8 nm at 15 kV
0.8 nm at 2 kV
0.9 nm at 1 kV
1.5 nm at 200 V with beam decleration
Coincident WD
0.8 nm at 15 kV
0.9 nm at 5 kV
1.2 nm at 1 kV
Ion beam resolution at coincident point:
4.5 nm at 30 kV
2.5 nm at 30 kV
Stages:
Flipstage with in-situ STEM Detector
Omniprobe sample extractor
5 Axis all piezo motorized
100 mm XY motion
Loadlock maximum, 3"
Sample types:
Wafer pieces
Packaged parts
TEM
Grids
Whole wafers, 4"
Maximum sample size: 80 mm diameter
User interface:
Windows GUI with integrated
SEM
FIB
GIS
Simultaneous patterning
Imaging mode
GIS:
Carbon
Tungsten
Platinum
Accessories:
Chiller – NESLAB ThermoFlex 900
UPS
SCS10i Pump
Landing voltage:
SEM: 50 V - 30 kV
FIB: 500 V - 30 kV.
FEI Helios NanoLab 450S is a dual-beam ion milling equipment that provides a unique combination of high level precision and accuracy. This system offers an ultra-precise milling process suitable for advanced sample characterization. The dual-beam unit includes an ion beam column, an in-column scanning electron microscope (SEM) stage, and a high resolution digital imaging machine. The ion beam column features high current, high energy, and high resolution ions, enabling a wide range of sample materials and depths to be milled. The in-column SEM stage offers scanning and imaging of the sample with high magnification and sub-micrometer resolution. In addition, the integrated digital imaging tool supplies both in-situ and post-milling imaging of the sample, including stereo optical imagery and 3D reconstruction. Helios NanoLab 450S has a wide range of comprehensive sample environments and features. It is equipped with a pneumatic sample rotation stage for rastering and parallel milling, a 20x sample stage with fine manual manipulation, an automated position pallet for specimen loading, and a pallet for custom sample tiles. The asset provides a precise positional resolution of up to 0.5μm, and is capable of both large-area and deep-field milling. It also features a variable pressure sample chamber which enables low vacuum milling for higher precisions at lower acceleration voltages. Additionally, the model includes a dual ion source, high-intensity electron (HE) source and a double-extraction electron gun for optimized milling beam deflection. FEI Helios NanoLab 450S is designed for a wide range of industrial and academic applications, such as defect analysis, MEMS and micro- and nano-fabrication, and sample preparation for SEM, TEM, and metallography. This equipment provides a flexible and reliable milling solution for various milling tasks in a wide selection of materials. It is designed to achieve high productivity with minimal surface damage, reliable repeatability and high levels of structural fidelity.
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