Used FEI Helios NanoLab 660 #9191763 for sale
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ID: 9191763
Vintage: 2014
Dual beam system
With BRUKER EDS and vibration isolation table
P/N: 1037473
TMC Vibration platform
SPICER SC24 Magnetic field cancellation system
Includes:
Workstation with Windows XP
PC
Operating system: Windows 7
(2) Widescreen LCD monitors, 24’’
ELSTAR Electron column with UC technology
TOMAHAWK Ion column with fast ion beam blanker
Eucentric stage: 150 x 150 mm
Beam deceleration mode
In-lens detector TLD with SE and BSED modes
Secondary Electron Detector (SED)
In-column detectors: iCD and Mirror detector
Beam current measurement
CCD IR Camera
Integrated plasma cleaner
Oil-free pumping system
Large table top with support
Description / Part number
iFast developers kit / 1011585
Seismic restraint kit / FP 6940/15
THERMOFLEX Chiller 60 Hz / 9432 909 96461
6-Channel detector amplifier / FP 6843/51
Charge neutralizer / FP 3440/32
Ice detector / FP 2303/09
Retractable dbs detector / FP 6903/20
Retractable stem 3+ detector / 1037464
System covers for helios nanolab / FP 3440/48
FEI Easylift ex nanomanipulator / 1033506
Delineation etch / FP 3400/21
Multichem gas delivery system / 1011754
Nano inst. kit nova nanolab / STRATA / HELIOS / V600 / 9425 061 69625
Cryocleaner ec / FP 2301/27
Cryocleaner ec spare vessel / FP 2301/28
Nav-cam+ / 1018721
Multichem installation tool / 1056070
Carbon deposition precursor for multichem / 1011761
Insulator enhanced etch precursor for multichem / 1011767
Platinum deposition precursor for multichem / 1011759
Selective carbon mill precursor for multichem / 1011763
(8) Wafer holders / 1004714
Joystick / FP 2311/01
Manual user interface / FP 2311/05
Mains matching and isolation transformer sem / FP 6343/02
Quick loader / FP 3610/13
Umb fib/tem specimen kit / FP 3660/05
Umb specimen holder kit / FP 3660/00
Vise specimen holder / FP 3660/10
2014 vintage.
FEI Helios NanoLab 660 is an industry-leading ion milling equipment designed for cross-sectional imaging and nanoscale analysis, allowing precision thinning of samples down to a nanometer-scale. Its unique dual beam system combines scanning and transmission electron microscopy (SEM/TEM) to effectively etch and image the sample surface with scale resolutions up to 0.5 nanometres. The unit makes use of a focused ion beam, or FIB, to thin samples with a stream of highly charged ions. The generated ions are directed towards the material to be removed from the sample, while controlling the beam's trajectory and energy to achieve desired etching depths. This makes it possible to accurately remove material down to a few nanometers. Helios NanoLab 660 also includes a state-of-the-art remote imaging machine enabling near real-time observation of the sample during milling. With its built-in vision tool, FEI Helios NanoLab 660 can take images of the sample in a variety of angles and magnifications while etching. It also gives users the ability to store images taken during the process and save them for future reference. The asset's automated milling software similarly gives users the capacity to set parameters and monitoring settings for a variety of sample materials. This includes setting a desired etching rate, depth, gas type, and temperature. It also features a dual source set up allowing users to switch between low- and high-energy ion beams, allowing more efficient, uniform and precise control of the etching process. Helios NanoLab 660 model is designed for use in both commercial and academic laboratories, allowing imaging and analysis with a variety of applications and samples; this includes characterization such as failure analysis, defect investigation, corrosion mapping, and 3D imaging. FEI Helios NanoLab 660 is designed with user-friendly, high performance features at an affordable price; this makes it attractive to laboratories of any size looking for a reliable way to do nanoscale imaging and analysis. With its cutting-edge dual beam equipment and advanced imaging capabilities, Helios NanoLab 660 is the ideal choice for high-resolution imaging and sample preparation tasks.
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