Used FEI / MICRION 2500 #9210447 for sale

Manufacturer
FEI / MICRION
Model
2500
ID: 9210447
Focused Ion Beam (FIB) system, parts machine Source: Gallium ion source Resolution: 5 nm (potentially up to 10 nm).\ Image: Micro channel plate Analog channelling with 256 grey level for high contrast Gas injector: Tungsten (for deposition) Chlorine (for selective etching) XeF2 (for selective etching) Spare port for other gases Charge: Neutralization: E-Gun (Filament issue) Load / Unload: Half automatic load lock Vacuum system: PFEIFFER Turbo pump system with fore pump Stage: 3” (6) Axes eucentric tilt stage Tilt: 0 – 60° Rotation: 360° (±180°) Eucentric tilt axis: Small Z: 10 mm (For eucentric compensation) Big Z: 20 mm X / Y: 75 mm Spare parts included Power supply: 50 kV (Bipolar supply for high current mode).
FEI / MICRION 2500 is a multi-purpose ion milling equipment designed to provide users with advanced milling capabilities and processes. The system utilizes a focused ion beam to generate a beam of highly charged ions to interact with a target material, resulting in material ablation. This powerful ion beam can be operated at energies between 0.2 and 15 kiloelectron volts (keV), and angular resolutions in the nanometer range can be achieved with the optional microscope packages. The unit is equipped with a number of features to create a powerful and functional milling process. The machine's digital scale is capable of controlling beam size, ranging from 0.5 nanometers to 30 micrometers. The variable exit aperture allows for a wide range of high-precision milling and scanning techniques, with a field size of up to 1,000 x 1,000 micrometers, and a minimum step size of 10 nanometers. The tool's nitrogen supply and controller are designed to reduce contamination and improve overall milling efficiency. By using a nitrogen gas feed with the ion beam, the oxygen in the asset is displaced, leading to a more efficient milling process with less material scaring and reduced etching effects when dealing with materials such as aluminum or copper. FEI 2500 can be programmed for a range of operations, such as etching, insulation, annealing and deposition. The unique capabilities of the model allow users to mill a variety of materials with exact areas, such as MEMS and microelectronic devices, optical integrated circuits, and biological and medical samples. The equipment also offers the opportunity to perform low-energy milling of high dielectric substrates such as SiN, SiO2, and GaN. The system is designed for fast, efficient, and high-precision milling and is highly user-friendly. The control unit has been designed to allow users to maintain a clear overview of their milling processes, and all parameters required to run the unit are easily accessible. Programs and tool capabilities are easily accessible through the intuitive and user-friendly software interface. MICRION 2500 has been developed to provide users with an efficient, powerful and cost-effective solution for milling a wide range of materials.
There are no reviews yet