Used FEI / MICRION 9500 #9210449 for sale

FEI / MICRION 9500 is an ion milling equipment designed to etch, alter, and remove ultra-thin layers of cryogenically deposited samples for a variety of research and industry applications. This system offers precise control over the parameters of ion bombardment, including angle of incidence, current, gap voltage, and pressure. It is designed for gentle etching of areas as small as 10 nm or greater, making it ideal for electron microscopy, materials characterization, and scientific research. FEI 9500 utilizes an electron beam to generate energetic particles to bombard a sample layer of material, eroding away the surface. The control console of the unit allows for the setting of various parameters, including energy, pressure, gap voltage, and incident angle. By adjusting the parameters, the user can determine the amount of surface area of a sample to be worked upon, as well as the depth of the surface which can be etched or otherwise altered. The ion beam generated by the machine is electronically adjustable to single digit Angstroms. It is also capable of variable ion gun currents ranging from 0.5mA to 10mA, with a maximum impact energy of 0.9 kiloelectron volts (KeV). In addition, the impingement angle of the ion beam can be adjusted from 0 ° to 80° and the pressure in the chamber is regulated by a booster pump. MICRION 9500's vacuum chamber is capable of pressuring to down to 1 x 10-6 Torr, allowing for the most precise etching procedures. Additionally, the tool is equipped with an ultrahigh-vacuum viewport that ensures a complete imaging asset, with WDS/EDS sample analysis available along with the manual imaging controls. Overall, 9500 is a reliable, precise model for ion etching and drilling of samples. It offers unmatched control over the bombardment parameters and an easy-to-use console, ensuring that any surface alteration is carefully and precisely executed. This equipment is invaluable for research and other scientific endeavors that require precise control over the etching of delicate samples.