Used FEI / MICRION Vectra 986FC #293718112 for sale
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ID: 293718112
Wafer Size: 8"
Focused Ion Beam (FIB) system, 8"
Upgraded to IET / WDR System
Circuit editor: 28 nm
Ion mill column
Acceleration: 50 keV
Ion column resolution: 5 nm
Bipolar power supply
Laser interferometer stage, 8"
Proprietary charge neutralization system
Virtual apertures: (14) Beam currents
Pre-soak chamber
Wafer holder, 8"
Current monitor sample holder
Tungsten metal deposition
Hard Disk Drive (HDD), 500 G
RAM Memory, 3400 Megabyte
Gases :
Chlorine / Bromine
Xenon difluoride
Siloxane (TMCTS)
Oxygen
Tungsten
Display:
Colour monitor, 21"
Line resolution (1280 x 1024)
Virtual apertures: (14) Beam currents
Gas delivery system:
Metal (Cl2)
Dielectric (XeF2)
(2) GAE Stations
Penta / Tri nozzle configuration
Dielectric deposition:
Tetra Methyl Cyclote Trasil Oxane (TMCTS)
Oxygen
No IR cameras.
FEI / MICRION Vectra 986FC is a high-performance focused ion beam (FIB) milling equipment designed for advanced semiconductor manufacturing and materials research applications. This cutting-edge instrument integrates ion beam milling capabilities with highly accurate imaging and analysis functions to enable precise fabrication and characterization of nanoscale structures. At the heart of FEI Vectra 986FC is its focused ion beam column, which generates a finely focused beam of gallium ions for milling and imaging purposes. The system is capable of producing ion beams with sub-nanometer resolution, making it ideal for tasks that require extremely high precision, such as circuit editing, failure analysis, and cross-sectioning of samples. MICRION Vectra 986FC features a versatile stage unit that allows for multi-axis sample manipulation and positioning, enabling users to precisely target specific areas of interest on a sample surface for processing. This stage machine also supports in situ monitoring and control of milling processes, ensuring real-time feedback and adjustment for optimal results. In addition to its ion milling capabilities, Vectra 986FC is equipped with advanced imaging and analysis functionalities that enhance its utility for diverse applications. The tool features high-resolution scanning electron microscopy (SEM) and secondary ion mass spectrometry (SIMS) imaging modes, providing detailed visualization of sample surfaces and compositional analysis at the nanoscale level. Moreover, FEI / MICRION Vectra 986FC offers automated imaging and data acquisition capabilities, streamlining workflows and increasing productivity for users. The asset's intuitive user interface and software controls allow for easy programming of complex milling and imaging tasks, making it accessible to both experienced researchers and newcomers to the field. One of the key strengths of FEI Vectra 986FC is its versatility in handling a wide range of sample types and sizes. Whether working with semiconductor wafers, biological samples, or materials science specimens, the model is equipped to accommodate various sample geometries and surface conditions, ensuring consistent and reliable results across different applications. Furthermore, MICRION Vectra 986FC is designed for high throughput processing, enabling rapid turnaround times for sample preparation and analysis. Its advanced chamber design minimizes contamination and sample drift, ensuring consistent and reproducible results even during extended operation periods. Overall, Vectra 986FC represents a state-of-the-art ion milling equipment that combines cutting-edge technology with user-friendly design to provide unmatched performance and reliability in the fabrication and characterization of nanoscale structures. With its advanced capabilities and versatile functionality, FEI / MICRION Vectra 986FC is a valuable tool for researchers and manufacturers seeking to push the boundaries of nanotechnology and materials science.
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