Used FEI Vectra 200DE #293818006 for sale
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ID: 293818006
Vintage: 2000
Circuit Edit Focused Ion Beam
Single-beam system
Used for circuit editing
Gallium source
Ion column
(4) Gas Injection Systems (GIS)
Television (TV) Monitor
Oscilloscope
Keyboard
Mouse
Monitor
Control Personal Computer (PC)
Faulty ion beam ignition control board
Gases: Xenon Difluoride (XeF₂), Platinum (Pt), Iodine, Oxide deposition
2000 vintage.
FEI Vectra 200DE is a cutting-edge ion milling equipment designed for precise and uniform material removal in a variety of applications, including semiconductor processing, materials science research, and failure analysis. This advanced tool offers unrivaled performance and versatility, making it a top choice for researchers and engineers seeking to achieve high-quality results in their work. At the heart of Vectra 200DE is its ion beam milling technology, which utilizes a focused beam of ions to remove material from the surface of a sample. This process enables users to precisely shape, polish, and thin samples with nanometer-scale precision, allowing for the creation of ultra-thin sections for transmission electron microscopy, SEM sample preparation, and other advanced applications. The system is equipped with a high-brightness ion source that delivers a tightly-focused ion beam with high current density, allowing for rapid material removal rates and high processing speeds. The high beam current also ensures excellent milling performance on a wide range of materials, including metals, ceramics, polymers, and semiconductors, making FEI Vectra 200DE suitable for a diverse array of applications. One of the key features of Vectra 200DE is its advanced imaging capabilities, which allow users to precisely control the milling process and monitor the progress in real-time. The unit is equipped with a high-resolution imaging machine that provides detailed views of the sample surface, allowing users to visualize the milling progress and adjust parameters as needed to achieve the desired results. In addition to its imaging capabilities, FEI Vectra 200DE offers a range of advanced automation features that streamline the milling process and improve overall efficiency. The tool is equipped with intuitive software that allows users to easily program milling parameters, set up milling sequences, and monitor progress remotely, reducing the need for manual intervention and ensuring consistent results. Vectra 200DE also features a highly stable sample stage that maintains precise positioning during milling, enabling users to achieve uniform material removal across the entire sample surface. This stability is essential for achieving high-quality results, particularly when working with delicate or multi-layered samples that require careful processing to avoid damage or distortion. Overall, FEI Vectra 200DE is a state-of-the-art ion milling asset that offers unmatched performance, versatility, and precision for a wide range of applications. Its advanced ion beam technology, imaging capabilities, and automation features make it an essential tool for researchers and engineers working in fields such as semiconductor processing, materials science, and failure analysis, where precise material removal is critical to achieving high-quality results.
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