Used FISCHIONE INSTRUMENTS 1020 #293750061 for sale

FISCHIONE INSTRUMENTS 1020 is an advanced etcher/asher apparatus. Developed to facilitate plasma etching, as well as other etching and and ashing processes, 1020 offers a set of features that make the process fast, efficient and reliable. FISCHIONE INSTRUMENTS 1020 is an integrated equipment, combining etching/ashing chamber, plasma source and RF power generator into one unified design. This allows for a fully automated etching/ashing process with precise control and monitoring. The system is able to quickly achieve process repeatability and provide sufficient uniformity required for research and production applications. The etching/ashing chamber of 1020 is designed with a double window to accommodate both positive and negative ashing operations. The first window can be used for positive etching/ashing processes, while the second window allows for conducting negative etching processes. The process can be monitored through a windowed viewport, providing visual inspection of the product during experiments. FISCHIONE INSTRUMENTS 1020 includes a ceramic throttle valve for precise gas delivery control, providing adjustable pressure ranges. The unit operates with an adjustable gas flow-rate between 1.0 and 20 sccm, and features a digital gas flow meter for continuous flow-rate adjustment. 1020 offers a wide range of plasma source options, including RF, DC, Pulsed DC (HFXE) and Pulsed Magnetron Sources (HFE). The RF power generator is capable of providing 20kW of output power, allowing for full power and process control. Additionally, FISCHIONE INSTRUMENTS 1020 includes diagnostics and equipment protection features to ensure that the machine remain safe and operational during experiments. 1020 is suitable for a variety of etching and ashing processes and can be integrated into larger production tool designs. It offers reliable productivity, uniformity and consistency, which makes it suitable for a wide range of industry and research projects. This apparatus provides a complete solution for plasma etching and ashing processes and ensures reliable and precise results.