Used HITACHI IML-4-1 #9283962 for sale

HITACHI IML-4-1 ion milling equipment is an advanced material sputter etching system. It is specifically designed to deposit a thin film of metal, insulator, and/or oxide materials on a variety of substrates. The unit uses a high voltage charged with an ac stabilized power supply, which is then ionized inside the vacuum chamber. The positively and negatively charged ions are then released from the power supply and accelerated across the vacuum chamber to collide with the material substrate, causing physical and chemical erosion. IML-4-1 machine utilizes a 4-axis, load lock, chamber, with the substrates mounted to a rotating fixture. The material is placed on the substrate holder and the fixture is loaded in the chamber. The chamber is then sealed and the tool is then pressurized to a high vacuum level. The asset has a maximum pressure of 5x10-7 Torr, with a minimum RF power of 30 Watts and a working temperature of up to 200°C. The RF power is adjusted by the auto-tuning feature in order to achieve optimal results. The ion milling model's computer-controlled process monitor offers users direct and real-time analysis of the entire process. This helps to ensure precision etching and results in ultra-high etching speeds with remarkably low distortions. Furthermore, the equipment is also equipped with an automated gas-flow monitor, so users can ensure a consistent etching environment. The system is designed with safety in mind. It has an emergency shutoff switch to ensure that users do not overpressurize the chamber. Furthermore, the unit is capable of monitoring the vacuum level and automatically shut down the machine if the vacuum level drops below a set value. Overall, HITACHI IML-4-1 ion milling tool is an advanced sputter etching asset designed to deliver high-precision etching results on a variety of material substrates. Its computer-controlled process and gas-flow monitors ensure an optimal etching environment while its safety features help prevent overpressurization and other accidents.