Used ION TECH PlasmaFab 340 #9358374 for sale

ION TECH PlasmaFab 340 is an advanced plasma etching equipment designed for precision micromachining in semiconductor technology. It is an ion milling system that uses highly charged ions to remove material from the surface of a workpiece. In contrast to traditional milling methods, the ion milling process does not involve the physical contact between the workpiece and the cutting tool, but instead uses energetic ions to cut into the material. The core component of PlasmaFab 340 is the RF-driven ion source. The source consists of an ionizor, a magnetic field confinement chamber, a power generation source, and a linear accelerator. The ionizor uses an electron gun and vibration mechanism to charge and accelerate both positive and negative ions up to the maximum energy of the linear accelerator. These ions are then directed towards the target workpiece substrate to etch away the material. The unit also includes a wafer stage for keeping the substrate at the proper orientation for uniform etching. This stage is capable of large area scanning, as well as single-point site processing. The wafer holder can also be used to adjust the distance between the substrate and the ion source to maximize the etching efficiency and uniformity. The machine is equipped with an automatic end-point detection tool, which allows the user to monitor the etching process and stop the operation at a desired level of material removal. This provides an efficient method of controlling the process and ensuring optimal performance. ION TECH PlasmaFab 340 is capable of precise etching with feature sizes down to 50nm, and is suitable for a wide range of advanced process applications. It can be used for applications such as single-mask lithography, contact window etching, high-aspect-ratio etching, doping, chemical mechanical planarization and related processes. The asset is highly reliable and robust, requiring minimal maintenance and setup. Combined with its low cost, it makes it an ideal solution for advanced etching and micromachining applications in the semiconductor industry.