Used ION TECH / VEECO Sourcerer #9276714 for sale

ION TECH / VEECO Sourcerer is an advanced ion milling equipment used for semiconductor material preparations. It is a high-precision tool you can use to precisely remove target material layers from the surface of wafers for a variety of applications. It utilizes advanced ion beam technology which is an advanced form of etching that uses ions instead of conventional chemical or physical etching methods. VEECO Sourcerer's ion source is charged up by electric wipers and is then released onto the wafer. This creates a beam of ions which is then guided to the sample's surface to produce milling on the material surface. The high powered ion beam is precisely directed onto the surface of the wafer by a digital guide. The efficacy of the system is outstanding. It can reach a high level of accuracy with its sub-micron (nanometer) milling resolution and can mill down to accurately eliminate defects such as scratches or protrusions as small as 20 nanometers. The controlled atmosphere of ION TECH Sourcerer also enables it to create incredibly tight wafer parameters for uniformity, height, flatness and depth. The parameters can be optimized depending on desired demands, with the controlled atmosphere allowing you to maintain a uniform etching pattern. Furthermore, the environment is fully automated, meaning manual handling of the wafer is no longer necessary. In terms of safety production, the whole experimental process is shielded by a Vacuum unit which ensures all the generated particles cannot escape. In other words, this provides a safe environment for both the operator and the equipment. Furthermore, the digitally guided ion source allows the operator to make minute adjustments to the parameters in order to get the most accurate results. In conclusion, Sourcerer is an advanced ion milling machine used for material preparations. Its ion beam technology provides a very accurate and precise way to remove material layers from the surface of a wafer. Moreover, it comes with a controlled environment, enabling the operator to optimize parameters for uniform etching and safe production. This superior tool truly provides a great deal of convenience and accuracy in material prep work.