Used NANO-MASTER NIE 4000 #9182949 for sale
URL successfully copied!
Tap to zoom
ID: 9182949
Vintage: 2016
Ion beam etching system, 14.5"
Physical etching with accelerating Ar ions
Patterned with thick resist for masking
Energetic ion flux during etching overheats:
Substrate
Resist
Substrate temperature: <50°C
SS Cube ion beam chamber
DC Ion gun: 12 cm, 1000 V, 500 mA
DC Motor driven: SS Shutters
Ion beam neutralizer
Ar MFC
Chilled water cooled: Substrate platen, 6"
Wafer rotation: 3-10 RPM
Vacuum stepper motor
Wafer tilt with stepper motor
Pumped rotational seal
Manual / Automatic wafer: Load / Unload
Typical etch rates:
Cu: 20 nm/min
Si: 50 nm/min
Etch uniformity: +/- 5% over 4" area
Turbo pump:
Base pressure with 500 1/sec:
5 x 10-6 Torr < 20 minutes < 2 x 10-7 Torr
Base pressure with 1000 1/sec: 8 x 10-8 Torr
Protect etched metal surfaces from oxidation
Recipe driven
Password protected
Safety interlocked
Missing part: Foreline pump
2016 vintage.
NANO-MASTER NIE 4000 is an ion milling equipment designed to provide high precision data and high surface flux rates. By using a focused ion beam (FIB), NIE 4000 creates nano-sized structures and materials from a variety of substrates. The machine features a high-quality, compact design, including two integrated chambers that can accommodate a wide variety of sample sizes. NANO-MASTER NIE 4000 system consists of a liquid nitrogen cooling unit, a computer-controlled operational unit, and a chamber where the ion beam is created and focused. At the center of the machine is the ion source, where the FIB is generated. This high-precision ion beam is capable of creating ultra-fine nanostructures from a variety of materials, including metals and thin film substrates. A fully automated gas conditioning unit helps to provide the highest quality data by removing any residual contaminants from the sample. NIE 4000 allows for accurate control over the ion beam energy, beam current, and focus. This allows for versatile fabrication with exact precision. With its specialized software package, NANO-MASTER NIE 4000 can also be used for imaging, precision depth profiling, and patterning. Additionally, the user interfaces allow for monitoring, automation, and user control. This makes it easy to customize a program to meet the user's specific fabrication needs. NIE 4000's integrated electrostatic lens provides a larger working distance, which helps to reduce ion penetration. Additionally, its large sample stage allows for more samples to be handled in a single run. Its enhanced computer-controlled operational tool ensures accurate and consistent data at the nanometer scale. NANO-MASTER NIE 4000 is an ideal asset for precision nanomaterials fabrication. Its advanced FIB technology and high-precision engineering provide superior performance and accuracy. NIE 4000 allows for greater customization, accuracy, and speed, making it an ideal choice for those looking for an advanced ion milling solution.
There are no reviews yet