Used PHILIPS / FEI Helios NanoLab 600 #9222516 for sale
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ID: 9222516
Vintage: 2010
Dualbeam Focused Ion Beam (FIB) system
Workstation:
Nano-prototyping
Nano-machining
Nano-analysis
Advanced TEM sample preparation
Electron optics:
Resolution: 0.9 nm @ 15 kV & 1.4 nm @ 1 kV
Detection: In-lens SE & BSE
Ion optics:
Sidewinder™ field emission focused ion beam optics
With liquid gallium ion emitter
Resolution: 5.0 nm @ 30 kV
Detection: CDEM Detector
Pattern: Imaging and patterning
With end-point detection through real-time monitor
AutoFIB
Platinum deposition
Selective carbon mill
Enhanced etch
TEM Sample preparation
AutoTEM G2
Micromanipulator: OMNIPROBE Autoprobe 200.2
Gas Injection system (GIS):
(2) Charged ports
Materials in charged ports: Platinum, Gold
Uncharged port
(5) Open ports for new sources
Tip life time:
EB 2-3 years
IB 3 months
Diagnostics:
EDS& EBSD
Pegasus package, EDAX
2010 vintage.
PHILIPS / FEI Helios NanoLab 600 is a state-of-the-art ion milling equipment designed to provide nanoscale milling and polishing with an outstanding level of precision and accuracy. This advanced technology is based on the concept of using accelerated ions to sputter or etch materials accurately and efficiently. It is an ideal choice for the newest nano and micro scale machining applications. FEI Helios NanoLab 600 system includes several key components. The IPD (Interactive Process Diagnostics) unit provides skilled operators with information about initial ion source parameters, which can be used to determine cutting speeds, chamber pressures, and other relevant operational data. The machine is also equipped with a field-emission scanning electron microscope (FE-SEM), allowing for imaging of the small-scale circuits and structures created by the ions. PHILIPS HELIOS NANOLAB 600 features a unique multi-pole electromagnet cluster source with a stationary ion beam source, which allows for a high degree of flexibility when designing processes. It also features a low pressure operating chamber, which provides an atmospheric environment where ions can move freely without destroying the surface of the material being etched or milled. This tool is designed with the latest in ion optics and ion manipulation technology, resulting in high levels of accuracy and control when cutting and etching materials. The NanoLab 600 also comes with a wide range of safety features. This includes a personal shielding asset which reduces the amount of radiation exposure to the operator during the operation of the model. The equipment also features an interactive graphical user interface (GUI), allowing operators to control the process from a remote terminal or computer. This ensures that the system is operated safely and efficiently. In conclusion, HELIOS NANOLAB 600 is an advanced ion milling unit that provides nanoscale milling and polishing with an exceptional level of accuracy and precision. It is equipped with a wide range of safety features and features a unique multi-pole electromagnet cluster source with a stationary ion beam source, which allows for a high degree of flexibility when designing processes. This machine is an ideal choice for the newest nano and micro scale machining applications.
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