Used PHILIPS / FEI Helios NanoLab 600 #9310922 for sale

PHILIPS / FEI Helios NanoLab 600
ID: 9310922
Dual beam FIB-SEM system With extreme high resolution column Fine-probe ion source.
PHILIPS / FEI Helios NanoLab 600 is an advanced ion milling equipment that uses focused ion beam (FIB) technology. It is suitable for precision nanofabrication, sample prep and imaging applications, providing precise control over material removal and particle size. This system comes equipped with a highly reliable ion source, a fast scanner, and an ion optical column, all of which combine to offer superior milling quality. The columns have also been designed to provide precise controllability of the ion beam allowing precise alignment of the FIB and improved precision in milling. For sample prep and imaging, the unit provides high resolution images and nanometre-size features. It also features a low-noise design and an intuitive user-friendly interface for easy control. Additionally, this machine offers different settings for different applications, allowing users to adjust all parameters. The flexible milling and imaging settings provide improved accuracy and optimized results. For material processing, FEI Helios NanoLab 600 offers precise milling capabilities and fast acceleration. The high-precision ion optical column, with a unique electrical path solution and multiple ion beam configurations, allows precise control of the milling process. It also enables a high degree of flexibility in terms of high speed, high resolution, and high throughput. The tool comes with an inert cryogenic environment and a non-destructive integrated platform. This unique feature provides superior control and repeatability in ion milling processes while minimizing sample damage. For increased throughput and reliability, this asset has an integrated automated sample handling model, allowing for rapid sample loading and unloading. Overall, PHILIPS HELIOS NANOLAB 600 is a reliable and highly capable ion milling equipment that offers superior performance and flexibility. It is suitable for a variety of nanofabrication, sample prep and imaging applications. This system provides precise and reliable results at high speed and with a low sample damage.
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