Used PHILIPS / FEI Nova Nano 430 #293799835 for sale
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ID: 293799835
Vintage: 2009
Field Emission Scanning Electron Microscope (FE-SEM)
Oil-free vacuum system
Chamber
Resolution: Up to 3-4 nm
Beam current:
High-resolution mode: Up to 10 nA
Analytical mode: Up to 22 nA
Accelerating voltages from 0.5 kV - 30 kV
Everhart thornley detector (for Secondary electrons)
Solid-state BSED for high vacuum
In Lens SE (TLD SE) and BSE (TLD BSE) detectors
Gatan Chroma CL Detector for wavelength 400-800 nm
EDS X-ray mapping (dual Bruker 30 mm2 detectors)
Low Vacuum Capability (< 0.1 Torr) using UHR low vacuum SED (Helix Detector) and low vacuum SED (LVD)
Deceleration Mode
IR-CCD camera for in-chamber viewing
5-Axes motorized Stage (X-Y-Z-Tilt-Rotation)
Working distance 5 mm -12 mm
Hard Disk Drive (HDD)
PC
Manipulator
2009 vintage.
PHILIPS / FEI Nova Nano 430 is a state-of-the-art ion milling equipment designed for precise and controlled material removal in various applications such as sample preparation for transmission electron microscopy (TEM), nanostructuring, and device fabrication. This advanced tool incorporates cutting-edge technology to deliver unparalleled performance in terms of milling speed, accuracy, and uniformity. One of the key features of FEI Nova Nano 430 is its high-resolution ion optics system, which enables the unit to achieve sub-nanometer precision in material removal. This is essential for applications that require precise milling of features at the nanoscale level. The machine is equipped with advanced ion sources that can deliver a wide range of ion species, making it highly versatile and suitable for processing a variety of materials including metals, semiconductors, polymers, and ceramics. PHILIPS Nova Nano 430 features a multi-beam ion milling capability, allowing users to simultaneously mill multiple areas of a sample with different ion species or energies. This capability is particularly useful for creating complex nanostructures or for performing simultaneous milling and imaging tasks. The tool also offers a range of milling strategies, including area milling, line milling, and spot milling, enabling users to tailor the milling process to their specific requirements. In terms of performance, Nova Nano 430 offers high milling rates and excellent milling uniformity across the sample surface. This ensures consistent results and minimizes variations in material removal, which is crucial for producing high-quality samples for TEM analysis or other applications. The asset is also equipped with advanced automation features, such as programmable milling recipes and automatic stage movement, which streamline the milling process and enhance user productivity. Furthermore, PHILIPS / FEI Nova Nano 430 is designed with user-friendly software interfaces that provide intuitive control over the milling parameters and allow for real-time monitoring of the milling process. The model supports advanced imaging capabilities, such as scanning electron microscopy (SEM) and focused ion beam (FIB) imaging, which enable users to visualize and accurately target the milling area with high precision. In addition to its advanced milling capabilities, FEI Nova Nano 430 is equipped with a range of safety features to ensure the protection of both the user and the equipment. These include interlocks that prevent unauthorized access to the system during operation, as well as automated shutdown procedures in the event of any abnormal conditions or malfunctions. Overall, PHILIPS Nova Nano 430 ion milling unit represents a cutting-edge tool for precise and controlled material removal at the nanoscale level. With its advanced features, high performance, and user-friendly interface, Nova Nano 430 is ideally suited for a wide range of applications in research, development, and manufacturing where accurate and efficient ion milling is essential.
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