Used PHILIPS / FEI Strata 400 #9302302 for sale

PHILIPS / FEI Strata 400
Manufacturer
PHILIPS / FEI
Model
Strata 400
ID: 9302302
Focused Ion Beam (FIB) system.
PHILIPS / FEI Strata 400 ion milling equipment is a versatile and powerful etching tool used in the fabrication of complex microelectronic devices, such as transistors and microprocessors. FEI Strata 400 features a three-axis motorized motion control system to provide easy and accurate positioning of the substrate and ion beam. The ion beam energy is adjustable from 0 to 300 volts and is coupled with an adjustable ion beam current of up to 20 milliamperes. With the three-axis motion control unit, substrates can be precisely milled down to thicknesses of just a few nanometers. PHILIPS Strata 400 is equipped with a pattern recognition machine that can understand a variety of 3D patterns and other structure sizes. It can also distinguish between different materials and can accurately detect the highest points in order to precisely mill high aspect ratio features. Additionally, Strata 400 includes a closed loop actuation tool that allows for fine-tuning of the ion beam current for exact sensitivity. PHILIPS / FEI Strata 400 ion milling asset has a variety of gas delivery systems, with oxygen as the primary etching gas, and chlorine, fluorine, sulfur hexafluoride, and xenon as additional etching gases. It also features adjustable gas flow rates for controlling the flow of a wide range of gases over the substrate adjustable time/duration control to precisely etch away precise amounts of material. FEI Strata 400 comes with a built-in automation model, including software that automates substrate loading and removal, chamber cleaning, vacuum pump maintenance, and other operations. This equipment allows for easy set-up and operation of the etching process, as well as error handling in case of problems. PHILIPS Strata 400 ion milling system is a powerful and reliable tool for etching out precise structures for a variety of applications. With its combination of precision motion control, adjustable beam energy, pattern recognition technology, gas delivery systems, and automation, it is an ideal tool for producing complex nanoscale electronic devices.
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