Used VEECO 350 C1 #9225182 for sale

VEECO 350 C1
Manufacturer
VEECO
Model
350 C1
ID: 9225182
Ion beam etch (IBE) system.
VEECO 350 C1 Ion Milling Equipment is a versatile, advanced ion milling system used to create sub-angstrom (SA) features on high-aspect-ratio structures and metal surfaces. The unit offers excellent precision, enabling artwork to be milled with accuracy of less than 5 Angstroms. Its built-in safety features and adjustable beam angle make it well-suited for a number of applications. Ion beam milling allows precise sculpting and prototyping of delicate features, and 350 C1 offers a number of features that enable efficient operation. A large-area ion source allows quick and uniform sputter etching across the sample area to yield an even surface finish. The In-Situ React ion Tow er(IRT) feature, meanwhile, enables effective masking and removal of layers using the substrate for pre-patterned tins. In-Situ Depth Profiling (IDP) allows for automated post-etch surface analysis, while sample rotation and sample tilt features enable the operator to orient the sample in the best orientation for the required features. In terms of underlying components, VEECO 350 C1 is powered by a 720 MHz PXI Interface Host processor board, installed in a static-safe environment. The base machine includes a stage providing dynamic motion control, a high precision sample holder, and an auto-focus mechanism that allows the user to set the ideal focus range. The base tool provides a data storage capacity for storing up to 32,000 profiles of the etching process. 350 C1 is a highly reliable asset with excellent processing capabilities. The advanced controls and mechanical components enable precise control of the ion beam for the most demanding ion milling processes. Its design helps to optimize process efficiency and output quality, resulting in consistent results with high reliability and repeatability. VEECO 350 C1 has been used in a wide range of applications, from semiconductor etching for micro-fabrication to aerospace components for deep hydrogen etching.
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