Used VEECO C-1 MicroEtch IBE 350 #9300433 for sale

VEECO C-1 MicroEtch IBE 350 is an ion milling equipment designed for etching and structuring of semiconductor and thin film devices. This system is a fully automated, production-ready ion beam etching tool, capable of etching a variety of substrate materials, including polysilicon, silicon, and titanium. Equipped with a state-of-the-art spectral ion source, the ion beam is dense, with precise control over trajectory, precision, and uniformity. The C-1's innovative ion source is designed to optimize ion beam trajectories, allowing for best-in-class control over etching depths and precision. It has an optimized repeatable motion unit which minimizes thermal drift and delivers continuous and uniform etch rates. The sophisticated software offers integrated control of machine settings, allowing for real-time adjustment to etching parameters and process conditions. The C-1 is designed with safety in mind. It features a unique vacuum-sealed chamber which offers a high level of ion containment to ensure operation within local safety requirements and to minimize radiation exposure. The advanced safety tool also includes additional safety and monitoring systems, including pressure and temperature sensors. The health and safety of operators is further ensured by sound deadening features, which allow for easy operation without subjecting operators to loud noises or hazardous material exposure. C-1 MicroEtch IBE 350 is a versatile, reliable, and efficient ion milling asset developed for commercial use. It has various advanced safety features and a cutting-edge spectral ion source, designed to maximize performance. It is capable of effectively etching substrates with precision and repeatability, making it an ideal solution for precision etching and structuring of semiconductor and thin film devices.