Used VEECO IBD-350 #9043203 for sale
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ID: 9043203
Ion Beam Deposition System
Main Unit:
(1) Deposition Chamber 0.2 cubic Meters, Pressure = -1Bar
(1) Deposition Chamber 0.75 cubic Meters, Pressure = -1 Bar, with Additional Components to Include
(1) Pfeiffer Model TPU 2200UPC Turbo Molecular Pump
(1) Pfeiffer TPU 2200C Turbo Molecular Pump
(1) CTI Cryogenics ON-BOARD Water Pump
(1) Amtek Process Instrument Dymaxion Dycor Residual Gas Analyzer Mass Spectrometers
Control Racks with the Following Combined Components:
(4) Rack Servers
(1) LCD Monitor
(1) Raritan MasterConsole MX Module
(5) CTI Cryogenics Controllers
(2) Pfeiffer Model TCP380 Vacuum Controller
(3) Sorenson Model DCS60-18E Power Supplies
(3) Sorenson DCS600-1.7E
(1) Hiden Analytical RC Interface Module
(3) Spellman SL1200 Controllers
(3) Spellman SL300 Controllers
(2) RFPP Model RF20M Power Supply
(4) APS Smart UPS SC450 Power Supplies
(1) Pfeiffer TCP5000 Vacuum Controller
(2) Pfeiffer Vacuum TCP600 Controllers
Support Equipment to Include:
(1) Polycold Series Model PFC-1100-LT, 2007 vintage
(2) Edwards QDP40 Dry Vacuum Pump Systems with Q-Series 2MCM Interface Modules
(1) Edwards QDP80 Dry Vacuum Pump System with a Q- Series 2MCM Interface Module
(3) CTI Cryogenics Model 9600 Compressors;
(1) Neslab CFT-150 Recirculated Chiller
(1) Power Cabinet, 208V, 3 Phase, 60Hz, 100A.
VEECO IBD-350 is a fully automated computer controlled ion milling system designed for precision surface milling. It uses an advanced form of micro-etching technology, which utilizes an Ion Beam Neutralizer System (IBN) to produce high-precision cuts on samples. The system is capable of variable depth milling with submicron accuracy. VEECO IBD 350 features a 200mm X-Y stage with a range of 7mm in the Y-direction and 37mm in the X-direction. It is equipped with a 10-335Kv/A ion source and a relative positional accuracy of 0.003mm. IBD-350 can perform sputtering, etching, beam deposition and milling processes. It delivers superior surface characteristics in a range of cryogenic and high-temperature applications. The ion milling process relies on energetic ions, typically argon, to etch away material in a concentrated layer. IBD 350 has a unique energy ratio of up to 5:1 to reduce depth of cut while enhancing surface effects. It is capable of delivering highly efficient results that include etching speed improved by approximately 50%, compared to conventional milling. To address customer specific requirements, VEECO IBD-350 features a range of customizable user settings that can be programmed and stored into the machine. It offers precise and repeatable etching or milling to obtain control over the ion beam depth and incident angles of various particles. VEECO IBD 350 also features automated end point detection and integrated diagnostics that identify instrument faults at the initial stage. IBD-350 is a reliable tool for researchers and industry engineers who need high-precision milling to obtain the desired sample surface. It offers significant advantages over conventional milling thanks to its fast cutting speed, variable energy ratio and user controlled settings. IBD 350 is highly efficient and cost-effective, making it an ideal choice for industrial and research applications.
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