Used VEECO Microetch RF 350 #9244343 for sale
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ID: 9244343
Ion beam system.
VEECO Microetch RF 350 is a plasma etcher/asher that provides high resolution plasma etching and ashing of a range of materials. Using a proprietary 13.56 MHz frequency, this etcher/asher offers superior speed, uniformity, and selectivity for etching/ashing processes. Furthermore, it has a mechanical wafer handling equipment with a standard miniature chuck, and is suitable for various chamber configurations to achieve superior performance. This etcher/asher utilizes radio frequency plasma etching and ashing processes that are used to create high quality surfaces with precision etch patterns. Its high power radio frequency etch power source provides excellent reproducibility to ensure high-quality and repeatable results. Furthermore, its precise plume control helps to reduce the process time, while providing accurate etch rates. Additionally, the etcher/asher is also equipped with an automated substrate cleaning and variable pressure system, for further process optimization and defect free etching. In terms of safety, Microetch RF 350 features an interlock unit, along with exhaust port and pump protection to make sure that the etching process is protected from plasma-induced damages. Moreover, the advanced pressure and temperature control provide users the ability to meet their desired safety standards. The etcher also includes a leak detector for additional level of safety and to identify any potential hazardous materials, such as a leak of chlorine-containing gas. To maximize user convenience, VEECO Microetch RF 350 includes intuitive user interface panels with programmable settings. This etcher/asher also has advanced data logging capabilities, allowing users to easily store and analyze etch parameters, recipes, and etch yields. Plus, with its remote service connection, operators can quickly and easily troubleshoot any problems with the machine. Overall, Microetch RF 350 is an ideal etcher/asher for etching or ashing various types of materials. With its high power, selectivity, speed, and uniformity, it is capable of producing high quality etch results with a minimum of effort. In addition, its advanced safety and user friendly features make it a perfect choice for both industrial and research applications.
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