Used VEECO RF 350 C2 IBD #9124215 for sale
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ID: 9124215
Wafer Size: 6"
Vintage: 1998
Ion beam deposion (IBD) cluster tool, 6"
Dep module
Etch module system
Transport module includes:
BROOKS Automation robot wafer handler system
Loadlock A & B
Electronics cabinet contains:
(2) APC 450 UPS
Raritan compu-switch
Industrial PC
(2) LEYBOLD INFICON IG3 Vacuum gauge controllers
PFEIFFER TCP380 Turbovac controller
(2) SORENSEN DCS60-18 Power supplies
SORENSEN DCS20-150 Power supply
SPELLMAN SL300 Power supply
SPELLMAN SL1200 Power supply
Process modules include:
PFEIFFER Turbo pump with TCP600 controller
CTI Onboard cyropump with fastregen sputtering module
CTI 8200 Compressor
RFPP AM-10/20 Auto matching network
ADVANCED ENERGY RF10M / RF20M Power supply
CTI Onboard controller
RF Matching network monitor
Main power distribution panel: 208V, 100A
1998 vintage.
VEECO RF 350 C2 IBD (Ion Beam Deposition) is an ion milling equipment specifically designed for semiconductor fabrication. Its integrated sputtering reactor and ion-beam impingement technology make it well-suited for a variety of materials deposition and milling operations. The system is capable of edge-defined film growth (EBSD) and other micro-device fabrication processes. The ion milling unit is vacuum-compatible and contains several features that optimize its efficiency. The RF 350 incorporates a high-frequency plasma source, a 2000 Watt RF power supply, and a 100 cm2 vacuum chamber, allowing for plasma photons and electrons to be generated for accelerated milling. The powerful RF source also serves as a critical component of the overall sputtering process, allowing for a range of deposition films from nanometers to microns in thickness, with precise uniformity. The RF 350 also features a sophisticated angular alignment of the ion source. This ensures the appropriate uniformity and thickness of the films to be deposited. The RF350 C2 contains two computer-controlled ion sources that can be individually adjusted for high-precision deposition film applications. In addition, VEECO RF350 C2 IBD illuminator includes a variety of optics and detectors to bring the highest quality materials to the entire manufacturing process. RF 350 C2 IBD is controlled by a comprehensive control machine that allows for improved process monitoring with repeatable results. The user-friendly graphical interface displays critical information in real-time and offers a range of data-capturing functions for the most complex applications. The ion milling tool is capable of achieving high-resolution milling and etching of various materials, including metals, polymers, carbon, and silicon. RF350 C2 IBD is an ideal choice for r2D-2D devices and nanostructures. Its integrated features and advanced technology make it perfectly suitable for tight production tolerances, thin, high-first films, and complex geometries, bringing the highest quality parts and materials to the user.
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