Used CYMER 5600 / 5610 #9030427 for sale

CYMER 5600 / 5610 lasers are ultra-high-power, single-beam lasers developed by CYMER, Inc. for extreme micro-electronics and wafer scale exposure purposes. These lasers are widely used in the production of semiconductor chips, integrated circuits (ICs), passive components, and other microelectronic components. 5600 / 5610 lasers offer the highest power, shortest pulse, and highest repetition rates available for photolithography. CYMER 5600 / 5610 lasers are based on Multi-Stripe technology, a unique form of diode-pumped, MOPA (Master Oscillator Power Amplifier) solid-state laser. This technology combines multiple narrow-bandwidth laser beams from a single laser head into a single high-power laser pulse. The Multi-Stripe design approach minimizes the non-linear effects traditionally associated with other diode-pumped laser designs. The resulting short-pulse laser equipment has a beam spot size that can be tailored to meet specific system requirements. 5600 / 5610 lasers produce high-power peak powers upwards of 10kW with a repetition rate of up to 100kHz. These lasers have a short-pulse duration of typically 10 nanoseconds (ns) and offer peak powers more than an order of a magnitude higher than other high-power laser platforms. In addition, CYMER 5600 / 5610 lasers feature advanced power stabilization and energy management to ensure the utmost in beam stability and long-term reliability from the laser unit. These lasers have been designed to virtually eliminate display artifacts and provide excellent vision during exposure of photomasks and thin-film devices. 5600 / 5610 lasers employ digital scan control, allowing for true sub-pixel resolution and superior patterning results. The lasers are also designed for low beam divergence to ensure precise focus and good overlay accuracy. In the wafer scale exposure environment, CYMER 5600 / 5610 lasers are specifically optimized for high resolution, through-the-lens imaging. The lasers provide fast scan speeds and improved process capability outlooks. 5600 / 5610 systems have been extensively field-tested and are designed to meet the most stringent process requirements for commercial production. When it comes to microelectronic production, CYMER 5600 / 5610 laser platform offers the highest peak power and shortest pulse width in the industry. This makes them an ideal choice for extreme microelectronics applications such as lithography, etching, high-density interconnect fabrication, micro-scale packaging, and MEMS fabrication. With their high-power and short-pulse capability, 5600 / 5610 lasers provide the most efficient machine for microelectronic device production, allowing for the highest throughput and best device yield.