Used CYMER ELS 5305 #9293806 for sale

CYMER ELS 5305 is a third-generation Excimer laser systems designed for Semiconductor Photomask and Component Production processes. It has been widely used in a variety of applications including Semiconductor Fabrication, Device testing, and Medical Laser Surgery. ELS 5305 is a pulsed UV-excimer laser, which uses a mix of xenon, fluorine, and chlorine gases to generate a laser beam in the 248 nm wavelength range. This laser beam is focused on a spot that is approximately 1.5mm in diameter on the surface of the photomask or component. The laser pulse duration is approximately 200 nanoseconds, allowing for the extremely precise placement of patterns on VLSI circuits with feature sizes of 5 micrometers or smaller. CYMER ELS 5305 is capable of a firing rate of up to 500 Hz. This allows the laser to expose more than 5,000 circuits on a single photomask. The laser also has a power output of up to 250 mJ per pulse. This power level enables the laser to make precise, high-quality exposures without requiring additional adjustments to the laser's focus or its control systems. ELS 5305 is equipped with an automated targeting and exposure control system, which allows for the efficient and independent control of the laser's position, power levels, and exposure time. This control system also allows fine adjustments to the laser beam's focus, allowing the laser to accurately pattern even the smallest features on the mask. The laser is housed in a cabinet that has temperature control, ventilation, and dust reduction and exhaust systems built in. This helps to ensure the laser is kept cool during operation and that any contamination is adequately removed before the machine is allowed to run again. CYMER ELS 5305 is known for its high reliability, quality, and accuracy. It is the perfect choice for a wide-range of semiconductor photomask or component production processes, making it one of the most sought after lasers in the industry.