Used CYMER ELS 5305 #9295002 for sale

CYMER ELS 5305 is an excimer laser equipment manufactured by CYMER, Inc., for semiconductor and component manufacturing. It is used for two key processes: lithography and wet etch. The laser system is optimized to deliver high performance and cost-efficiencies while meeting the demanding process requirements of emerging device architectures. ELS 5305 utilizes a thulium-doped ceramic laser technology to emit short-pulsed ultraviolet (UV) light of different wavelengths. With pulse repetition rates of up to 10 Hz, and pulse energies of up to 170 mJ available, the laser unit can efficiently produce the exposure energy required for the creation of highly precise photomask features. Furthermore, according to CYMER, its proprietary laser pulsing techniques render the laser unaffected by ambient temperature and humidity, thus ensuring repeatability of exposure results. For wet etching processes, the laser machine is capable of producing etch depths down to 0.35 μm and etch widths greater than 1.5 μm. Given the short pulse duration of the laser, 0.37 microseconds, the wet etch process can provide greater precision, particularly with shallow etch depths. CYMER ELS 5305 is also equipped with a proprietary advanced video microscope and focal control systems (V-MIC) for automated lithography processes. By incorporating sophisticated position-sensing, probing, and mapping technologies, the V-MIC ensures focus accuracy is maintained throughout the entire patterning process. To ensure long-term tool reliability, ELS 5305 incorporates a closed-loop cooling asset that helps maintain a consistent 80 degree operating temperature at all times. Additionally, an advanced air purifying model has been included that reduce airborne particles to as low as 0.2 microns. Overall, CYMER ELS 5305 is an advanced laser equipment designed for precise semiconductor and component manufacturing. It features intuitive controls, advanced exposure / etch technology, automated focus control, and reliable temperature/particulate control, making it the perfect fit for high-end lithography and wet etching applications.