Used CYMER ELS 5400 #9366025 for sale

CYMER ELS 5400 is an excimer laser light source designed for lithography and micromachining applications. It features superior beam characteristics and reliability that make it ideal for use in a wide range of production processes. CYMER ELS-5400 produces UV output at wavelengths between 193-335 nm, providing precise, repeatable processing results. Its superior beam characteristics make it capable of precise, fine processing such as cutting, shaping and drilling of miniscule features on chips, lenses and other small parts. Its high pulse rate of greater than 400 pps ensures vacuum and annealing processes are completed quickly and accurately. ELS 5400 also offers high reliability and repeatability, due to its advanced power supply design which maintains stable output at all times. Furthermore, its modularity and precise metrology capabilities allow for easy imaging, even with complex mask designs. Its superior scan speed of up to 494 mm/s ensures fast job completion, while its field and reshape feature, coupled with reduction of total laser electrode power, lead to faster exposure rates and speeds up productivity. Furthermore, its dual beam delivery system efficiently transports and rotates the beam, leading to highly precise imaging. ELS-5400 features a wide range of safety features that make it safe to operate, while its graphic user interface allows easy control and monitoring of the system. Additionally, its high laser power stability and long lifetime, with a minimum of 1 million shots, ensure continual performance and low maintenance costs. In conclusion, CYMER ELS 5400 is an ideal choice for micromachining and lithography projects due to its high performance, precision, speed, reliability and low maintenance costs. Its advanced feature set and beam delivery system make it an ideal choice for complex designs and for quickly producing high quality results.