Used CYMER ELS 5410 #9188512 for sale

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Manufacturer
CYMER
Model
ELS 5410
ID: 9188512
Vintage: 1998
KrF Scanner laser EX12 EX14 S202 S203 1998 vintage.
CYMER ELS 5410 laser is an industrial-grade etch, scribe and marking laser that offers users Precise and reliable material processing operations. It is a diode-pumped solid state (DPSS) Nd:YVO4 near-infrared laser source with a range of wavelengths from 1064 nm up to 532nm. The laser is designed for applications such as deep-etching, surface-marking, and dicing of more materials, and has the flexibility to dynamically switch between multiple applications. The 5410 laser has a maximum pulse energy of 24 mJ and a repetition rate up to 20 kHz, allowing for fast and accurate processing for most applications. It features advanced beam control technology, with a near-field-encoded beam and fast positioning, giving users the advantage of maintaining a constant power level throughout the material processing operation. The beam is focused with a built-in CMOS TV Camera and can be automatically adjusted according to the input data. The laser also employs a range of protective measures to allow users to work safely, including a non-contact laser beam profile monitor, attention interlock and laser power monitor. These ensure the laser stays within a safe threshold and limits accidental contamination or burning of the material. The 5410 laser is capable of working with both manual and automated systems. It is easy to integrate into any production line and comes with a range of additional features, including data logging for safety, visual feedback for power and recent data logging and beam control previews for setup adjustment. CYMER ELS-5410 is a powerful and customizable laser platform, incorporating the latest in laser technology for applications that require fast and accurate etching, scribing and marking. With its advanced beam control, protective features and simple integration into automated systems, users have the assurance of a safe and reliable process for a variety of applications.
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