Used CYMER ELS 6300 #154882 for sale

CYMER ELS 6300 is a high-powered excimer laser used in advanced wafer processing applications such as semiconductor device fabrication, Flat Panel Display production, and advanced lithography. This laser was designed for use in high volume, large-area processing and is the most powerful of the ELS series that CYMER offers. The 6300 is configured with an optically pumped, timed pulsed laser, powered by an Ar-F laser gas mixture with an energy level of 300 mJ per pulse. The beam is produced via an open combination optical equipment that uses a conjunction of spherical and cylindrical lenses and deflectors for smooth transition without focal spot distortion. Output power densities of up to 20 Watts/cm2 result in clean lithography patterns and fast production lines. This laser is also capable of rapid ablation at low pulse energy settings, enabling a higher process throughput in etching and deposition applications. The 6300's patented advanced pulse timing control technology, Thermal Control System, allows for greater peak power control through special algorithms and takes into account critical environmental factors such as pressure, temperature and laser unit stability. This laser also features a built-in MEMS-based beam stability machine that provides excellent beam shape accuracy and uniformity within +/-0.5mJ. Further, it offers easy and intuitive maintenance for faster operations and reduced downtime. The user can adjust and update settings remotely with its built-in Ethernet connection. ELS 6300 is CE certified and ISO certified, making it a reliable and dependable choice for advanced wafer processing applications. With its wide range of advanced features and reliable performance, it is one of the best laser systems currently available on the market.