Used CYMER ELS 7600M #9240618 for sale

CYMER ELS 7600M is an advanced excimer laser equipment designed for high-speed patterning of semiconductor wafers. This platform provides extremely precise laser-beam control and patterning capabilities through its proprietary technology. The laser system offers enhanced deck spacing flexibility, optimized pulse characteristics, and advanced algorithm set-up. ELS 7600M produces an incredibly fine beam of laser light able to create patterns with pitches of up to 0.15 μm. This laser unit is capable of tuning pulse duration down to 5 μs for the best possible patterning precision. With an achievable power output ranging from 5 to 200 mJ, it can perform a variety of high-density micron-level patterning tasks with great accuracy. CYMER ELS 7600M has lasers available in numerous wave lengths, from 193 - 351 nm, to carefully tailor laser-beam characteristics to each deposition process, ensuring the best possible results. It provides superior dynamic control, allowing for deep focus depth of up to 8 μm and excellent stability for long-term operation in the most challenging environments. The laser machine's optical spacing is adjustable from 60 up to 600 mm for maximum efficiency. The laser head is attached to a set of three vertical scan galvos which deliver highly accurate and efficient scanning by controlling the location of the laser spot on the target. ELS 7600M can generate patterns up to eight times faster than its competitor systems, and with a pulse-degree macro up to 50000 lines per second, it delivers unparalleled production speed. The laser tool also features an integrated beam view camera that monitors the scans and outputs dynamic images of the output in real time. The intuitive software assists engineers in setting up the laser asset accurately and quickly for maximum precision. Additionally, the proprietary Data Acquisition and Control software enables remote monitoring and control of the laser for advanced networking and monitoring capabilities. Overall, CYMER ELS 7600M is an advanced excimer laser model designed to perform high-speed patterning of semiconductor wafers with extraordinary accuracy and precision. Its impressive set of features, including adjustable wave lengths, dynamic pulse control, and optimized beam patterning, makes the equipment ideal for extremely demanding applications.