Used PANASONIC PLD MOC #9223140 for sale

PANASONIC PLD MOC is a high performance, industrial-grade CO2 metal organic chemical vapor deposition (MOCVD) laser. This equipment allows for precise growth of thin film crystals and creates a reliable, repeatable and stable bonding of thin films over large areas. It features a multi-cavity CO2 laser source, which provides a high-power direct-write capability. This makes it possible to write patterns of various designs and sizes with excellent uniformity, as well as produce high-quality thin films from a wide variety of materials. PLD MOC also offers a range of working gases allowing for deposition of both III/V and oxides materials. With the addition of various additives to the working gas, a wide range of different materials can be deposited, including diamond-like-carbon films, diamond films, and even transparent conductive oxides (TCOs). This makes it an ideal system for the manufacture of light emitting diodes (LEDs), sensors, and many other opto-electronic applications. PANASONIC PLD MOC operates through the use of a high power laser-beam-directed strike that enables clean ablation of a substrate and the deposition of a thin film over the ablated area. It incorporates a high power Kw fiber laser, which is used to ablate pre-defined patterns. This laser source is coupled with a high-precision, high-resolution galvo mirror that enables precise ablation of the targets. This makes it possible to implement complex, high-precision, high-throughput requirements and ensures process repeatability and consistency. With its robust design and high-precision galvo mirror unit, PLD MOC offers high throughput and yields uniformity even on substrates with difficult topologies. This machine can also be used to deposit different films ranging from single layers to several hundred layers. Additionally, it features a proactive monitoring tool that allows for real-time feedback on the process stability and performance. Overall, PANASONIC PLD MOC laser is a versatile asset that is capable of high throughput and precise ablation and deposition processes. It is especially suitable for the manufacture of opto-electronic components, providing stable, uniform, and repeatable processing with a wide range of materials and layers.