Used ABM 350W #9227481 for sale

ABM 350W is a mask aligner created for photolithography applications in the semiconductor industry. It is a modular device capable of automated alignment, exposure, and development of a variety of substrates. A semiconductor wafer is placed in the Aligner Base Module; the Aligner Reader Module is then used to detect the photomask alignment and image position from the scanning camera. A subsequent alignment algorithm is used to adjust the substrate's position to match the position of the mask. The optical equipment of 350W consists of a digital camera, a high-brightness lamp, and a transmission 8X projector. The dynamic alignment process is guided by a closed-loop system which quickly adapts itself to compensate for misalignment. The digital camera is highly accurate and is capable of resolving micro-sized features. The Exposure Module of ABM 350W is equipped with a 400W xenon lamp for exposure of the photomask onto the substrate. The exposure can be precisely adjusted by controlling the intensity and the exposure time of the lamp. Lastly, the Development Module of 350W is designed to develop the exposed area of the substrate, providing a controlled process for the removal of the remaining photoresist. It enables optimal development conditions for features such as raised contacts, vias, and patterned wafers with different heights and widths. ABM 350W enables high-accuracy, automated photolithography process for both microelectronics and optoelectronics applications. Its modular design allows for flexibility and scalability and it provides a high-resolution, low-distortion imaging unit for precise alignment and overlay measurements. Furthermore, its closed-loop machine allows for continuous process optimization, resulting in improved first-pass yields and repeatability.