Used ABM 6/350/NUV/DCCD/BSV/M #293653250 for sale

ABM 6/350/NUV/DCCD/BSV/M is a state-of-the-art high-performance mask aligner designed for precision micro-electronics fabrication. It provides industry-leading accuracy and stability in the alignment of photomasks, resulting in lower failure rates in semiconductor fabrication processes. ABM 6/350/NUV/DCCD/BSV/M aligner is well-suited for semiconductor wafer production, as it offers high throughput, low cost of ownership, and a large work envelope accommodating up to 25" x 25" substrates. At its core, ABM 6/350/NUV/DCCD/BSV/M is a direct contact-type mask aligner equipped with a projection lens and five micropositioners. The equipment is designed to ensure that the patterned photomask and substrate are accurately aligned before the exposure process. This is achieved via a parallel alignment approach with an integrated collimating lens, which provides the perfect repetition of the fine pattern from the photomask onto the substrate. The high-resolution micropositioners are used for x,y and z-axis focusing, allowing for sub-micron accuracy in all three axes. ABM 6/350/NUV/DCCD/BSV/M also features an advanced DCCD (Direct Contact Cathode Discharge) scanner for increased throughput and accuracy. This combines a particle-free projection environment with a high-accuracy optical system, allowing for optimal mask-to-substrate registration. It also comes with a powerful breathing unit that monitors the astigmatism and coma aberration of the projection lens, ensuring repeatable results. ABM 6/350/NUV/DCCD/BSV/M provides superior illumination uniformity thanks to its proprietary Bright Source Variable (BSV) mask projection machine. This tool uses multiple LEDs which can be individually adjusted, allowing the user to modify the illumination intensity and uniformity to perfectly match their application requirements. In conclusion, ABM 6/350/NUV/DCCD/BSV/M is an industry-leading mask aligner providing superior accuracy and repeatability for all types of semiconductor and photonic applications, including laser scribing and single pulse exposure. It offers a robust, reliable platform for achieving the highest yields and the lowest cost of ownership.