Used ASYST 0FH3000-001 #9384810 for sale

ASYST 0FH3000-001
Manufacturer
ASYST
Model
0FH3000-001
ID: 9384810
Wafer pre-aligner.
ASYST 0FH3000-001 is a state-of-the-art mask aligner designed for high accuracy photomask pattern transfer to semiconductors and other substrates. It is compatible with standard photomask sizes and features a multi-stage high accuracy alignment equipment. The system consists of a symmetrical and independent x-y table and an UV contact imaging source. 0FH3000-001 uses a four-stage alignment process to ensure extremely high accuracy photomask placement. It uses two sensors to locate a marker on the photomask and a reference photomask to accurately align the mask to the substrate. The unit then uses two projection interferometers to identify each of the photomask register marks. This information is used to accurately place each of the die on the photomask relative to the fiducial marks. This ensures high placement accuracy over the full surface area of the photomask. ASYST 0FH3000-001 also features a multi-zone field of view. This feature allows the machine to target multi-LED or multi-zone illumination to ensure uniform correction in multi-zone and/or full-sized photomasks. The tool uses zone imaging systems that combine with the interferometric alignment sensitivity to achieve fast and accurate placement of photomask patterns over the full chip area. 0FH3000-001 is designed for high accuracy photomask pattern transfer to the wafer. To ensure high accuracy and reliability, ASYST 0FH3000-001 features advanced opto-mechanical design elements such as high precision actuators, zero-force drive systems, and advanced chem-resistant materials to create service-free operation. The asset is also equipped with a high-resolution imaging source, ensuring superior performance for sub-micron photomask patterns. In summary, 0FH3000-001 is an advanced mask aligner designed to facilitate high accuracy photomask pattern transfer to electronic growing substrates. It features a multi-stage high accuract alignment model with zone imaging systems to ensure uniform correction. The equipment is also equipped with zero-force drive systems and advanced chem-resistant materials for reliable operation.
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