Used CANON FLAG-1500 #9161633 for sale

CANON FLAG-1500 is a mask aligner designed to produce micron-scale patterns of metal, materials, and devices. It is capable of processing substrates with large openings and non-flat surfaces as well as providing mask registration accuracy of 1.5μm or better for a 200mm wafer. It supports resolving non-contact side edge alignment and spacer edge alignment for gate array technology with 0.1μm accuracy or better. FLAG-1500 is a fully automated mask aligner with a strong focus on providing smooth and reliable operation. It is powered by an EGA 5kW CANON E Seiko Shot, and can etch metal, silicon, and glass masks. The maximum size of the mask is 880mm x 880mm for all applications. It is also equipped with a 266mm laser wafer alignment system, an automatic E-beam resist coater, a TMA (Transverse Magnetic Alignment) frame, and an OBIRCH edge aligner for alignment registration. This aligner offers a variety of features, including the ability to measure a wafer's outline pattern quickly and accurately. It is also able to drive small and large patterns accurately and provides a high-speed measurement capability. Additionally, CANON FLAG-1500 offers a user-friendly interface and can automatically store registration points to ensure fast re-calibration. It can also accurately measure the flatness of the work piece in three dimensions. FLAG-1500 conforms to international standards such as SEMI and CE. It also includes a variety of advanced safety and environmental features, including a dust filtration system and a fire suppression system. It is capable of operation in severe industrial environments and can operate continuously for up to 12 hours. In conclusion, CANON FLAG-1500 is an efficient and reliable mask aligner that offers a wide range of features and capabilities. It is equipped with a variety of safety and environmental features as well as a user-friendly interface and a fast re-calibration capability. This machine is ideal for handling a wide variety of wafers and materials, as well as providing accurate alignment with patterns down to 1.5μm or better.