Used CANON MPA 3000W #9393325 for sale

CANON MPA 3000W Mask Aligner is a medium-size professional lithography equipment designed to fabricate high-quality semiconductors. This system uses a contact alignment method for precise mask to wafer alignment to achieve high accuracy and resolution. CANON MPA-3000 W Mask Aligner features a large exposure surface area for large wafer processing and uniform exposure over the full surface. The unit is equipped with a 6-inch main alignment method which uses 0.5 micron resolution capable of providing less than 1 micron accuracy. It also features an automatic pin position detector that measures the pin position and computes any needed correction to ensure proper wafer positioning. The 3-inch CCD camera with 0.1 micron resolution enables alignment to the desired mask pattern when manufacturing semiconductor devices. MPA 3000W Mask Aligner also has an automatic microscope illumination machine which makes inspecting the exposure pattern more accurate. It is equipped with a programmable interferometer tool which checks the stability of the alignment before exposure. A high-resolution exposure monitor monitors the exposure dose and time. The asset also features a high-speed air bearing stage for faster wafer exchange which reduces cycle time and improves throughput. MPA-3000 W Mask Aligner is a versatile, cost-effective lithographic model that offers a total equipment integration capability for mask to wafer exposure and alignment. It features a user-friendly design and easy to use controls which makes equipment set-up and operation straightforward. Its advanced features make it suitable for research and industrial use.