Used CANON MPA 500 Fab #293750910 for sale

CANON MPA 500 Fab is a mask aligner designed to provide precision and accuracy for lithography applications. It is a one-shot aligner equipped with advanced UV light sources, making it suitable for photolithography processes. The equipment also includes a high-accuracy detection system which is capable of measuring and controlling overlay, focus and exposure parameters. CANON MPA 500FAB is equipped with a Four-Quadrant Transmittance Unit (FQTS) that provides an excellent balance of image resolution, exposure dose and throughput rate. The machine comes in two sizes, the 500F and the 500L, both of which feature a highly efficient auto-switching LED and Laser light source. The LED source can scan an area of up to 900mm2 while the laser machine is able to cover areas up to 2000mm2. MPA-500FAB is capable of producing patterns with a resolution of 1.5 micron or better, and supports batch sizes of up to 1000 wafers. MPA 500 Fab utilizes a Multi-beam projection for imaging with a large selection of lenses covering fields from 2mm up to 25.4mm. This feature allows it to align patterns across multiple wafers or layers in a single processing step. The focal plane detector, which is capable of measuring to within 0.4 micron, can be calibrated for repeatable accuracy. In addition, the machine's auto-focusing capabilities provide further precision during the alignment process. The machine is equipped with a comprehensive software tool to enable integration with customers' existing SPC and wafer integrity software. It has built-in process monitoring and statistical capabilities, along with a variety of analysis tools. It is also capable of automatic job scheduling and recipe management, resulting in increased throughput and up time. CANON MPA 500-FAB has been tested and proven to be highly accurate and reliable in production environments. It is compatible with a variety of substrates, ranging from IC dice to thin-film resistor elements. Its features and a wide range of process conditions available make it ideal for sensitive applications such as MEMS fabrication and wafer bumping.