Used CANON MPA 500 Fab #293758142 for sale

Manufacturer
CANON
Model
MPA 500 Fab
ID: 293758142
Wafer Size: 5"
Mask aligners, 5", parts system 1999 vintage.
CANON MPA 500 Fab is a mask aligner ideal for the fabrication of microelectronic parts and components. It features high-resolution exposure power and precise exposure reduction control, allowing fabrication of high-density patterns and even ultra-fine patterns. CANON MPA 500FAB also features a newly developed exposure system equipped with excimer lasers and cameras, enabling accurate exposure of even the smallest of features on the mask. The processor incorporates an ARM Cortex-A17 CPU, allowing mask printing and exposure at high speed. Additionally, it comes with an automated systems for mask cleaning and crystallization, as well as data transfer and processing, allowing for accurate pattern recognition. MPA-500FAB is equipped with an advanced exposure system featuring one-step alignment and exposure, as well as a PS CMO feature for imprint exposure of fine circuit patterns. It can perform high-density pattern formation, stabilization, alignment accuracy control, and exposure in a single process. Furthermore, its high optical alignment stability enables a maximum exposure speed of 6.5 m/s. CANON MPA-500FAB also features an advanced Image Tools Package, which simplifies the image processing and makes mask exposure faster and more accurate. CANON MPA 500-FAB is capable of high-precision prints on masks and circuit boards, with a minimum linewidth of 50nm. Additionally, it can use a variety of substrates, including silicon wafers, and can handle both SMD and LGA mounting. MPA 500 Fab is powered by a motor-driven mechanism, providing a stable and precise alignment accuracy under both low and high temperature conditions. Moreover, it utilizes sensors to detect the mask thickness, thereby ensuring accurate and efficient exposure. Overall, MPA 500FAB is an ideal tool for the precise and efficient fabrication of microelectronic parts and components, thanks to its precise, high-precision exposure system, efficient pattern processing, and robust construction. It offers excellent accuracy and speed, ensuring hassle-free masking and fabrication, even for ultra-fine patterns and circuits.
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