Used CANON MPA 500 Fab #9291905 for sale
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ID: 9291905
Mask aligners
Does not include:
Illuminators
Control boxes
Power supplies.
CANON MPA 500 Fab is a mask aligner used in photolithography processes used in the chip making and nanotechnology industries. Based on CANON original scalable Multi-Projection Aligner technology, CANON MPA 500FAB has a resolution of 1 micron, with the ability to cover a chip size up to 6-inch wafers. It features a redesigned alignment equipment that provides users with improved accuracy, with a high-precision linear guide system and vacuum center alignment technology that reduce thermal expansion. The device boasts a superior range of accuracy, with devices having the ability to achieve 2D alignment accuracy in the range of 0.1-0.2 microns for both X and Y axes. MPA-500FAB uses UV exposure technology with multiple light sources in order to project patterns onto the chip surface, which is used to create the desired line width and detail as desired. It also features an optimized projection unit that increases alignment accuracy and reduces the time it takes to properly align images, with auto-focus capacity and laser alignment support. In addition, the device includes a powerful motor drive machine, which helps enable further accuracy and repeatability in the nanotech production process. The device is further enhanced with features such as real-time online monitoring of the alignment process, and exposure control capabilities that allow for high accuracy in the printing and masking process. It also has an adaptable light source output in order to increase the potential for higher throughput and compatibility with the desired product manufacturing process. CANON MPA-500FAB has been designed to meet the highest demands of a wide range of high-precision nanotech production processes. With its high-precision alignment accuracy, its range of advanced technologies, and its adaptable output, it is the ideal solution for mass production processes that require the highest level of accuracy and output.
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