Used CANON MPA 500FA #293592857 for sale

Manufacturer
CANON
Model
MPA 500FA
ID: 293592857
Wafer Size: 5"
Vintage: 1983
Aligner, 5" Conversion kit CTR Box (2) Accessories packing Lamp power supply Missing: Generator Air press unit 1983 vintage.
CANON MPA 500FA is an advanced full-field mask aligner that offers precise lithographic capabilities for diverse fields such as opto-electronics, MEMs and ASICs. This state-of-the-art equipment enables stable UV exposure across the full surface of the substrate. CANON MPA-500FA provides superior exposure accuracy with a uniformity of ±0.5 mJ/cm2 and excellent repeatability for alignments. The advanced auto-print function automatically adjusts the printing mode to fit the substrate size, providing increased productivity. The quick adjustment feature allows quick and easy change of exposure settings. The built-in image library furthermore allows simultaneous exposure of multiple substrates, maximizing cost-effectiveness. The alignment accuracy is enhanced by an advanced X-Y Stage equipment, reducing the risk of misalignment. This results in an extremely precise process with a high yield rate. MPA 500 FA has a high resolution imaging system which provides uniform exposure across the entire substrate. The unit is capable of processing substrates up to 200mm with a high clamping precision and reduces shaking through the active vibration reduction machine. The built-in safety tool offers protection from over-exposure and oxidation. The mask aligner is furthermore equipped with a touch panel that allows intuitive operation with a direct-reading scale. MPA 500FA also offers environmental protection with high efficiency air filters and exhaust systems. High-power halide lamps ensure stable illumination and homogeneity, while a high-power UV curing method abbreviates the curing time and increases throughput. CANON MPA 500 FA is an ideal mask aligner for both research and production applications, enabling users to achieve high-speed and accurate printing. The equipment is compatible with a wide range of substrates, such as silicon-on-sapphire, silicon, sapphire and glass blocks.
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