Used CANON MPA 500FA #293821331 for sale

CANON MPA 500FA is a high-performance, multi-gas mask aligner that is suited for advanced and high volume photomask production, research and development and imaging applications. Its main features include a 50mm x 50mm to 500mm x 500mm user-selectable layout size, with a maximum wafer size of 200mm, up to three-dimensional registration for complex objects and auto focus frame registration for better alignment accuracy. It also features a pattern grabber for faster configuring of larger areas and automatic sample change-over mechanism for faster throughput. Its high-precision multi-axis stage enables simultaneous stepper control of the feature pitch, the overlay accuracy, and the pullback accuracy. It can handle 1.5-μm pixel sizes and provides a high throughput of 1500 wafers/hour for identical frames. Additionally, it offers a high-accuracy stage alignment which ensures repeatability within 1 µm and reference-frame registration accuracy within 0.3 µm. CANON MPA-500FA has also been designed to reduce particle degradation and increase cleanliness. This is achieved through the self-supporting profile design which isolates substrate and photomask components from each other. Additionally, the micro-bubbles in the immersion liquid of the pattern scanner preserve the integrity of patterns and reduce potential distortion of scanning results. MPA 500 FA uses CANON proprietary CANON GIM (Gene Image Metrology) software which offers a unique software architecture to enhance alignment precision, throughput speed and measurement accuracy. This software features a built-in comprehensive image-processing library that monitors hundreds of defects and provides powerful pattern recognition capabilities for registration. Overall, MPA 500FA mask aligner is designed for wafer-scale production and developmental projects and offers superior precision alignment accuracy, higher throughput speeds and better measurement accuracy. This makes it the ideal choice for advanced and high volume photomask production and research and development applications.